Non-ionic low diffusing photo-acid generators
AssigneesInternational Business Machines Corporation, Central Glass Company, Limited
InventorsTakehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong, Rudy J. Wojtecki
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Abstract
Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group. The disclosed non-polymeric PAGs release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs undergo a thermal reaction to form a sulfonic acid.
Claims22
A compound of formula (3):
- wherein
- n is 1,
- Ar is a monovalent aryl radical selected from the group consisting of
- and
- R′ is 1-adamantyl.
A compound of formula (3):
- wherein
- n is 2,
- Ar is a monovalent aryl radical selected from the group consisting of
- R′ is 1,6-hexylene (*—CH2(CH2)4CH2—*).
Dependencies are inferred from the claim text.