Substrate transfer system and heat treatment apparatus using same

A substrate transfer system comprising:

• a substrate transfer part capable of transferring a substrate while holding the substrate;
• an elevating mechanism including a support axis extending in an upper-lower direction and being capable of moving the substrate transfer part along the support axis within a predetermined range;
• a first exhaust port located at a position selected from at least one of on the support axis and near the support axis above an upper limit of the predetermined range;
• a second exhaust port located at a position selected from at least one of on the support axis and near the support axis below a lower limit of the predetermined range;
• an exhaust part connected such that exhaust is available through the first exhaust port and the second exhaust port;
• a first exhaust route located above the upper limit of the predetermined range;
• and
• a second exhaust route located below the lower limit of the predetermined range,
• wherein the first exhaust port and the second exhaust port are connected to the exhaust part through the first exhaust route and the second exhaust route, respectively.