Method of producing a multi-layer magnetoelectronic device and magnetoelectronic device

A method of producing a multilayer magnetoelectronic device, the method comprising:

• depositing a multilayer structure including at least two ferromagnetic layers disposed one on top of the other and each having a magnetic anisotropy with a corresponding magnetic moment, wherein each two adjacent ferromagnetic layers of the at least two ferromagnetic layers are separated by a respective nonmagnetic layer, and wherein each of the ferromagnetic layers is deposited at a respective azimuthal angle with respect to a reference direction extending in the plane of extension of the respective ferromagnetic layer and at a nonzero angle of incidence with respect to a direction perpendicular to the plane of extension of the respective ferromagnetic layer, such that the respective ferromagnetic layer exhibits uniaxial magnetic anisotropy,
• (a) wherein a magnetization curve is specified for the magnetoelectronic device to be produced,
• (b) wherein, after having specified the magnetization curve, the number of ferromagnetic layers and, for each of the ferromagnetic layers, the magnetic moment and the magnetic hardness are determined in such a manner that the specified magnetization curve is obtained,
• (c) wherein subsequent to having determined the number of ferromagnetic layers and their magnetic moments and magnetic hardnesses, for each of the ferromagnetic layers individually a magnetic material, a thickness, an azimuthal angle and an angle of incidence are determined in such a manner that the determined magnetic moment and magnetic hardness of the respective ferromagnetic layer is obtained, and
• (d) wherein finally the step of depositing the multilayer structure is carried out using the determined material, thickness, azimuthal angle and angle of incidence for each of the ferromagnetic layers.