Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof

A substrate liquid processing method using the substrate liquid processing apparatus, said substrate liquid processing apparatus comprising:

• a processing unit configured to perform a water repellency imparting processing on a substrate by supplying a silylation liquid to the substrate;
• a nozzle including therein an election port configured to supply the silylation liquid to the substrate positioned in the processing unit,
• silylation liquid flow path in the nozzle formed in a vertical direction in which the silylation liquid flows in the nozzle toward the election port and an end portion of the silylation liquid flow path, and a blocking fluid flow path in the nozzle formed in a horizontal direction joins with the silylation liquid flow path at a junction located at an upstream side of the election port such that a flow of a blocking fluid blocks the silylation liquid within the silylation liquid flow path in the nozzle from an atmosphere outside the election port by filling a potion of the silylation liquid flow path in the nozzle between the junction and the ejection port with the blocking fluid:
• wherein said junction is located within the nozzle at a connection point between the silylation flow path and the blocking fluid flow path such that the silylation liquid and blocking fluid are capable of being elected from the end portion of the silylation liquid flow path;
• a silylation liquid supply mechanism configured to supply the silylation liquid to the silylation liquid flow path in the nozzle through a silylation liquid supply line;
• and
• a blocking fluid supply mechanism connected to the blocking fluid flow path of the nozzle through a blocking fluid supply line and configured to supply the blocking fluid to the blocking fluid flow path such that the silylation liquid existing at an upstream side of the junction remaining within the portion of the silylation liquid flow path between the junction and the election port in the nozzle is protected from the atmosphere outside the election port by the blocking fluid filled in an area in the nozzle between the junction and the ejection port within the silylation liquid flow path,
• the substrate liquid processing method comprising:
• performing the water repellency imparting processing on the substrate water repellent by supplying the silylation liquid to the substrate from the ejection port of the nozzle;
• stopping the supply of the silylation liquid from the nozzle;
• and supplying the blocking fluid to the silylation liquid flow path to block the silylation liquid within the silylation liquid flow path from the atmosphere outside the election port by the blocking fluid.