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US 9,908,831 B2Granted
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsMasatoshi Echigo, Masako Yamakawa
Life of this patent
Estimating the term…
Abstract
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
Claims24
A resist composition comprising
- a compound represented by the formula (1) or formula (2):
- wherein R1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms;
- R2 are each independently a hydrogen atom, a halogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group and may be the same or different on the same naphthalene ring;
- at least two of R2 is a hydroxyl group on each of the naphthalene moieties in formula (1);
- at least one of R2 is a hydroxyl group on the naphthalene moieties in formula (2);
- n is an integer of 1 to 4;
- the structural formulas of the repeating units in the formula (1) and in the formula (2) may be the same or different;
- in the formula (1),
- m1 are each independently an integer of 2 to 7, and
- provided R1 is not a fluorene ring, a methylene group, a methylene group having one phenyl group, a methylene group having one hydroxy phenyl group,
- and
- in the formula (2),
- X are each independently an oxygen atom or a sulfur atom,
- m2 are each independently an integer of 1 to 6,
- provided each naphthalene moiety has at least one R2 that is hydroxyl, and
- a hydroxyl group is at the 1st, 2nd, 5th or 6th position on each of the naphthalene moieties in formula (2);
- and
- a solvent.
15 more elements
A resist composition comprising
- a compound represented by formula (1-1) or formula (2-1):
- wherein R1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms;
- R3 are each independently a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an alkenyl group having 2 to 10 carbon atoms and may be the same or different on the same naphthalene ring;
- the structural formulas of the repeating units in the formula (1-1) and in the formula (2-1) may be the same or different;
- n is an integer of 1 to 4;
- in the formula (1-1),
- m3 are each independently an integer of 2 to 7,
- m4 are each independently an integer of 0 to 5,
- m3+m4 is an integer of 2 to 7, and
- provided R1 is not a fluorene ring, a methylene group, a methylene group having one phenyl group, a methylene group having one hydroxyl phenyl group,
- and
- in the formula (2-1),
- m5 are each independently an integer of 1 to 6,
- m6 are each independently an integer of 0 to 5,
- m5+m6 is an integer of 1 to 6, and
- a hydroxyl group is at the 1st, 2nd, 5th or 6th position on each of the naphthalene moieties in formula (2-1);
- and
- a solvent.
15 more elements
A resist composition comprising
- a compound represented by formula (2-2):
- wherein R1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms;
- R3 are each independently a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an alkenyl group having 2 to 10 carbon atoms and may be the same or different on the same naphthalene ring;
- the structural formulas of the repeating units in the formula (2-2) may be the same or different;
- n is an integer of 1 to 4;
- in the formula (2-2),
- m6 are each independently an integer of 0 to 5, and
- a hydroxyl group is at the 1st, 2nd, 5th or 6th position on each of the naphthalene moieties in formula (2-2);
- and
- a solvent.
7 more elements
Dependencies are inferred from the claim text.