Imprint template and methods thereof
AssigneeSeagate Technology LLC
InventorsSundeep Chauhan, Alexander Kantorov, Kim Yang Lee, David Kuo, Rene Johannes Marinus Van de Veerdonk, Barmeshwar Vikaramaditya
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Abstract
Provided herein is a method, including forming a first template including a first pattern, wherein forming the first template includes self-assembly of diblock copolymers guided by an initial pattern; forming a second template including a second pattern, wherein the second pattern corresponds to a servo pattern; and forming a master template from the first template, wherein the master template includes one or more portions of the first pattern combined with the second pattern.
Claims16
A method, comprising:
- forming an initial template comprising an initial pattern;
- forming a first template from the initial template, wherein
- forming the first template includes self-assembly of diblock copolymers guided by the initial pattern, and
- the first template comprises a first pattern having a uniform symmetry of dots in a pillar structure and a greater pattern density of the dots than the initial pattern;
- forming a second template comprising a second pattern corresponding to a servo pattern for a recording medium;
- and
- forming a master template from the first template, wherein
- forming the master template includes
- spinning resist onto the dots of the first pattern of the first template,
- imprinting the resist with the second template to form thin resist and thick resist over the pillar structure,
- curing the thin resist and the thick resist, and
- etching the thin resist and the thick resist and the pillar structure to remove the pillar structure under the thin resist to form portions of the first pattern combined with the second pattern.
A method, comprising:
- forming a first template from an initial template,
- wherein the first template comprises a first pattern at about a 1-Tdpsi pattern density with a uniform symmetry of pillar structured dots;
- forming a second template,
- wherein the second template comprises a second pattern corresponding to a servo pattern for a recording device;
- and
- forming a master template from the first template, wherein
- forming the master template includes
- spinning resist onto the pillar structured dots,
- imprinting the resist with the second template to form thin resist and thick resist over the pillar structured dots,
- curing the thin resist and the thick resist, and
- etching the thin resist and the thick resist and the pillar structured dots to remove the pillar structured dots under the thin resist to form portions of the first pattern combined with the second pattern.
A method, comprising:
- forming a first template comprising a first pattern of pillar structures with a uniform symmetry,
- wherein forming the first template comprises self-assembly of diblock copolymers guided by an initial pattern;
- forming a second template comprising a second pattern,
- wherein the second pattern corresponds to a servo pattern;
- and
- forming a master template from the first template, wherein
- forming the master template includes
- spinning resist onto the pillar structures,
- imprinting the resist with the second template to form thin resist and thick resist over the pillar structures, and
- etching the thin resist and the thick resist and the pillar structures to remove the pillar structures under the thin resist to form portions of the first pattern combined with the second pattern.
Dependencies are inferred from the claim text.