Vacuum apparatus and method of monitoring particles
AssigneeSamsung Display Co., Ltd.
InventorsEun-Ju Song, Hoonchul Ryoo
Life of this patent
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Abstract
A vacuum apparatus includes a vacuum chamber, first sensor units disposed in the vacuum chamber facing a deposition direction of particles, and second sensor units disposed in the vacuum chamber, each disposed on a corresponding first sensor of the first sensor units facing the deposition direction, wherein the first sensor units are configured to sense a pressure in the vacuum chamber and an absorption amount of the particles adsorbed to the first sensor units, and the second sensor units are configured to sense the pressure in the vacuum chamber.
Claims19
A vacuum apparatus, comprising:
- a vacuum chamber;
- first sensor units disposed in the vacuum chamber facing a deposition direction of particles;
- and
- second sensor units disposed in the vacuum chamber, each disposed on a corresponding first sensor of the first sensor units facing away from the deposition direction,
- wherein the first sensor units are configured to sense a pressure in the vacuum chamber and an absorption amount of the particles adsorbed to the first sensor units,
- wherein the second sensor units are configured to sense the pressure in the vacuum chamber,
- wherein each of the first sensor units comprises:
- a first sensor case;
- and
- a first sensor disposed on the first sensor case facing the deposition direction, and
- wherein each of the second sensor units comprises:
- a second sensor case;
- and
- a second sensor disposed on the second sensor case facing away from the deposition direction.
A method of monitoring particles in a vacuum apparatus, comprising:
- sensing, by first sensor units, a pressure in a vacuum chamber and an absorption amount of the particles adsorbed to the first sensor units, the first sensor units disposed in the vacuum chamber facing a deposition direction of the particles;
- sensing, by second sensor units, the pressure in the vacuum chamber, the second sensor units disposed in the vacuum chamber facing away from the deposition direction and disposed on corresponding first sensor units;
- and
- analyzing a contamination level of the vacuum chamber,
- wherein each of the first sensor units comprises:
- a first sensor case;
- and
- a first sensor disposed on the first sensor case facing the deposition direction, and
- wherein each of the second sensor units comprises:
- a second sensor case;
- and
- a second sensor disposed on the second sensor case facing away from the deposition direction.
Dependencies are inferred from the claim text.