De-bonding and cleaning process and system
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYing-Ching Shih, Jing-Cheng Lin, Szu-Wei Lu
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYing-Ching Shih, Jing-Cheng Lin, Szu-Wei Lu
Estimating the term…
Methods and tools for de-bonding and cleaning substrates are disclosed. A method includes de-bonding a surface of a first substrate from a second substrate, and after de-bonding, cleaning the surface of the first substrate. The cleaning comprises physically contacting a cleaning mechanism to the surface of the first substrate. A tool includes a de-bonding module and a cleaning module. The de-bonding module comprises a first chuck, a radiation source configured to emit radiation toward the first chuck, and a first robot arm having a vacuum system. The vacuum system is configured to secure and remove a substrate from the first chuck. The cleaning module comprises a second chuck, a spray nozzle configured to spray a fluid toward the second chuck, and a second robot arm having a cleaning device configured to physically contact the cleaning device to a substrate on the second chuck.
A method comprising:
A method comprising:
A semiconductor processing tool comprising:
Dependencies are inferred from the claim text.