Back to results
US 9,873,663 B2Granted
Fluorenyl β-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
AssigneesSamyang Corporation, Korea Research Institute of Chemical Technology
InventorsChun-Rim Oh, Min-Sun Lee, Won-Jung Lee, Yong-Il Cho, Seung-Rim Shin, Jong-Il Shin, Sang-Oh Lee, Kun Jun
Life of this patent
Estimating the term…
Abstract
The present invention relates to a novel β-oximester fluorene derivative compound, a photopolymerization initiator comprising the same, and a photoresist composition.
Claims10
A fluorenyl β-oxime ester derivative compound of Formula 1:
- wherein R1 to R10 are each independently hydrogen, halogen, an alkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms, an alkoxy group having 1-20 carbon atoms, an arylalkyl group having 7-40 carbon atoms, a hydroxyalkyl group having 1-20 carbon atoms, a hydroxyalkoxyalkyl group having 2-40 carbon atoms or a cycloalkyl group having 3-20 carbon atoms.
Dependencies are inferred from the claim text.