# US 9,873,110 B2 · Method for deposition of noble metal nanoparticles on catalysts to promote same, and the compositions so produced > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,873,110 B2 - Document ID: US9873110B2 - Status: Granted - Kind: B2 - Application number: 14/534,103 - Filed: 2014-11-05 - Published: 2015-05-14 - Granted: 2018-01-23 - Earliest claimed: 2013-11-09 - Assignees: Sensiran - Applicants: Sensiran - Inventors: Abbas Ali Khodadadi; Yadollah Mortazavi; Mohammad Javad Parnian; Ali Taheri Najafabadi - Web page: https://patentgrep.com/patent/US9873110B2 ## CPC - B01J 23/8913: {Cobalt and noble metals} - B01J 35/39: Photocatalytic properties - B01J 35/45: Nanoparticles - B01J 35/70: characterised by their crystalline properties, e.g. semi-crystalline (catalysts comprising carbon B01J21/18; molecular sieves B01J29/00) - B01J 35/77: Compounds characterised by their crystallite size - B01J 37/34: Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves {; Ionic sputtering; Flame or plasma spraying; Particle radiation} - C23C 16/18: from metallo-organic compounds - B01J 2235/00: Indexing scheme associated with group B01J35/00, related to the analysis techniques used to determine the catalysts form or properties - B01J 2235/10: Infrared [IR] - B01J 2235/15: X-ray diffraction - B01J 2235/30: Scanning electron microscopy; Transmission electron microscopy - B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A method for promoting the supported catalysts using noble metal nanoparticles. Different noble metal precursors are preferentially deposited onto the supported metal catalysts through Chemical vapor deposition (CVD), and compositions so produced. Further, the promoted catalyst is used for CO and CO2 hydrogenation reactions, increasing the reaction conversion, C5+ compounds selectivity and chain growth probability. The active phase of catalyst can be either cobalt oxide, nickel oxide or their reduced format (Co0 or Ni0), and the noble metal is preferably Ruthenium. ## Claims ### Claim 1 A method for producing a catalyst comprising: forming, on a support surface, an active metal surface of a precursor catalyst, wherein: the active metal surface of the precursor catalyst is selected from the group consisting of cobalt oxide, nickel oxide, reduced formats (Co0 or Ni0) and combinations thereof, and the support surface of the precursor catalyst is made of a material selected from the group consisting of γ-Al2O3, TiO2, carbon nanotubes or CNT, and combinations thereof; and depositing, via chemical vapor deposition, ruthenium metal nanoparticles onto the active metal surface, the depositing including reacting on the active metal surface of the precursor catalyst a ruthenium metal precursor vapor with a reactant gas, at a reacting temperature at which the precursor catalyst catalyzes a decomposition of the ruthenium metal precursor vapor into ruthenium metal nanoparticles, wherein the reacting temperature is below a temperature at which the ruthenium metal precursor vapor substantially deposits ruthenium metal nanoparticles upon the support surface of said precursor catalyst, and wherein the reacting temperature is within the range of about 150° C. to about 200° C. ### Claim 2 (depends on 1) The method according to claim 1, wherein the precursor catalyst is an alumina-supported cobalt catalyst. ### Claim 3 (depends on 1) The method according to claim 1, wherein said ruthenium is about 0.01% to 1% by weight of active metal. ### Claim 4 (depends on 3) The method according to claim 3, wherein said ruthenium is about 0.05% to 0.3% by weight of active metal. ### Claim 5 (depends on 1) The method according to claim 1, wherein the ruthenium metal nanoparticles are carried by Argon gas to said precursor catalyst. ### Claim 6 (depends on 1) The method according to claim 1, further comprising heating a sublimation zone of a chemical vapor deposition assembly to about 80° C. ### Claim 7 (depends on 1) The method according to claim 1, further comprising obtaining an Fourier Transform Infrared (FTIR) pattern of the ruthenium metal nanoparticles that have decomposed during the chemical vapor deposition. ### Claim 8 A method for producing a catalyst comprising: depositing ruthenium metal nanoparticles onto first support surfaces using chemical vapor deposition of a ruthenium metal precursor to produce a first effluent; depositing ruthenium metal nanoparticles onto a first precursor catalyst using chemical vapor deposition of the ruthenium metal precursor to produce a second effluent, the first precursor catalyst including first active metal surfaces and second support surfaces; obtaining an Fourier Transform Infrared (FTIR) pattern of the first effluent and the second effluent for temperatures between 100° C. and 280° C.; and determining a preferential temperature range that extends between a first temperature and a second temperature, the first temperature corresponding to a temperature at which decomposition of the ruthenium metal precursor is detected in the second effluent, the second temperature corresponding to a temperature at which decomposition of the ruthenium metal precursor is detected in the first effluent, wherein the chemical vapor deposition of the ruthenium metal precursor in the preferential temperature range preferentially deposits ruthenium metal nanoparticles upon the first active metal surfaces and minimally deposits ruthenium metal nanoparticles upon the second support surfaces of the first precursor catalyst. ### Claim 9 (depends on 1) The method of claim 1, wherein the ruthenium metal precursor vapor includes ruthenocene vapor. ### Claim 10 (depends on 1) The method of claim 1, wherein the reactant gas includes hydrogen. ### Claim 11 (depends on 1) The method of claim 1, wherein the depositing further includes: concurrently carrying the ruthenium metal precursor vapor and the reactant gas onto the active metal surface of the precursor catalyst.