Method for making crystalline silicon-based solar cell, and method for making solar cell module

A method for manufacturing a crystalline silicon-based solar cell, the method comprising:

• forming a texture on a surface of a single-crystalline silicon substrate by anisotropic etching;
• cleaning the surface of the single-crystalline silicon substrate using ozone;
• and
• depositing an intrinsic silicon-based layer on the texture on the single-crystalline silicon substrate,
• depositing a conductive silicon-based layer on the intrinsic silicon-based layer, wherein
• an isotropic etching treatment for rounding a recess portion of the texture is not performed between the forming the texture and the cleaning the surface of the single-crystalline silicon substrate using ozone,
• a size of the texture prior to the depositing the intrinsic silicon-based layer is less than 5 μm, and
• after the depositing at least a part of the intrinsic silicon-based layer and before the depositing the conductive silicon-based layer, the intrinsic silicon-based layer is subjected to a plasma treatment in an atmosphere of a gas comprising hydrogen.