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US 9,870,935 B2Granted
Monitoring system for deposition and method of operation thereof
AssigneeApplied Materials, Inc.
InventorsEdward W. Budiarto, Majeed A. Foad, Ralf Hofmann, Thomas Nowak, Todd Egan, Mehdi Vaez-Iravani
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Abstract
A monitoring and deposition control system and method of operation thereof including: a deposition chamber for depositing a material layer on a substrate; a sensor array for monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and a processing unit for adjusting deposition parameters based on the changes in the layer thickness during deposition.
Claims7
A method of operation for a monitoring and deposition control system comprising:
- depositing a multilayer stack comprising alternating layers of molybdenum and silicon on a substrate;
- monitoring deposition of each molybdenum layer and each silicon layer for changes in a layer thickness of each silicon layer and each molybdenum layer during deposition;
- and
- adjusting deposition parameters based on the changes in the layer thickness of each silicon layer and each molybdenum layer during deposition, wherein each silicon layer and each molybdenum layer has a layer thickness having an error of 0.1 angstroms or less.
1 more element
Dependencies are inferred from the claim text.