Back to results
US 9,870,897 B2Granted
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
AssigneeApplied Materials, Inc.
InventorsJames D. Carducci, Kenneth S. Collins, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy, Shahid Rauf
Life of this patent
Estimating the term…
Abstract
A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Claims20
A plasma reactor comprising:
- a window assembly;
- first and second coil antennas adjacent said window assembly;
- a first current distributor coupled to said first coil antenna and a second current distributor coupled to said second coil antenna;
- first and second RF feed terminals;
- a conductive feed plate lying in a plane above said first and second coil antennas and coupled to said second RF feed terminal, and a plurality of axial rods coupled between a peripheral annular zone of said conductive feed plate and said second current distributor;
- a conductive ground plate in a plane between said conductive feed plate and said first current distributor;
- a first radial conductive feed rod lying in a plane above said conductive ground plate and having an inner end coupled to said first current distributor and an outer end coupled to said first RF feed terminal.
4 more elements
Dependencies are inferred from the claim text.