System and method for controlling ion implanter
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsPo-Feng Tsai, Chia-Tong Ho, Chia-Hsing Liao, Sheng-Wei Lee, Jo-Fei Wang, Jong-I Mou
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Abstract
A system, a method, and a non-transitory computer readable storage medium for controlling an ion implanter are disclosed herein. The system includes a sample module and a control module. The sample module is configured to generate a summarized value from process data of the ion implanter, and the process data correspond to a control parameter. The control module is configured to tune a control parameter, and the control module performs an ion implantation by releasing tools of the ion implanter in accordance with the control parameter when the summarized value meets a predetermined stability requirement.
Claims20
A method, comprising:
- performing a first calculation based on an initial value of a control parameter and a predetermined adjusted value, in order to determine a first value and assigning the first value to the control parameter of an ion implanter;
- transforming process data of the ion implanter to a summarized value, the process data corresponding to the control parameter that is assigned with the first value;
- on condition that the summarized value corresponding to the first value does not meet a predetermined stability requirement, performing a second calculation to determine a difference between the initial value and the predetermined adjusted value, in order to obtain a value different from the first value based on a result of comparing the summarized value, which corresponds to the first value, with a previous summarized value which corresponds to the control parameter that is previous to being assigned with the first value, and assigning the value different from the first value to the control parameter;
- and controlling tools of the ion implanter to perform an ion implantation in accordance with the control parameter on condition that the summarized value meets the predetermined stability requirement.
A system comprising:
- a sample module configured to generate a summarized value from process data of an ion implanter, wherein the process data correspond to a control parameter;
- and
- a control module configured to perform a first calculation to determine a first value based on an initial value of the control parameter and a predetermined adjusted value and assign the first value to the control parameter, wherein the control module performs an ion implantation by releasing tools of the ion implanter in accordance with the control parameter on condition that the summarized value corresponding to the first value meets a predetermined stability requirement,
- wherein on condition that the summarized value corresponding to the first value does not meet the predetermined stability requirement, the control module is further configured to perform a second calculation to determine a difference between the initial value and the predetermined adjusted value, in order to obtain a value different from the first value based on a result of comparing the summarized value, which corresponds to the first value, with a previous summarized value, which corresponds to the control parameter that is previous to being assigned with the first value, in order to assign the value different from the first value to the control parameter.
A non-transitory computer readable storage medium storing one or more programs, for execution by a computer system, the one or more programs comprising instructions for:
- sampling process data of an ion implanter for a predetermined time period, the process data corresponding to a control parameter;
- performing statistical analysis on the process data to obtain a summarized value of the process data;
- performing a first calculation to determine a first value based on an initial value of the control parameter and a predetermined adjusted value, and assigning the first value to the control parameter;
- on condition that the summarized value corresponding to the control parameter having the first value does not meet a predetermined stability requirement, performing a second calculation to determine a difference between the initial value and the predetermined adjusted value, in order to obtain a value different from the first value based on a result of comparing the summarized value, which corresponds to the first value, with a previous summarized value which corresponds to the control parameter that is previous to being assigned with the first value, and assigning the value different from the first value to the control parameter;
- and controlling the ion implanter to perform an ion implantation in accordance with the control parameter on condition that the summarized value meets the predetermined stability requirement.
Dependencies are inferred from the claim text.