Method for repairing a mask
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShinn-Sheng Yu, Anthony Yen, Wen-Chuan Wang, Sheng-Chi Chin
Life of this patent
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Abstract
A method includes inspecting a mask to locate a defect region for a defect of the mask. A phase distribution of an aerial image of the defect region is acquired. A point spread function of an imaging system is determined. One or more repair regions of the mask are identified based on the phase distribution of the aerial image of the defect region and the point spread function. A repair process is performed to the one or more repair regions of the mask to form one or more repair features.
Claims20
A method of repairing a mask, the method comprising:
- inspecting a mask to locate a defect region for a defect of the mask;
- acquiring a phase distribution of an aerial image of the defect region in an imaging system;
- determining a point spread function of the imaging system;
- identifying one or more repair regions of the mask based on the phase distribution of the aerial image of the defect region and the point spread function;
- and
- performing a repair process to the one or more repair regions of the mask to form one or more repair features.
A method, comprising:
- receiving a patterned extreme ultraviolet (EUV) mask, the patterned EUV mask including an absorption region including an absorption material, a reflective region defining a main feature, and a defect;
- determining a defect region resulting from the defect and intruding the reflective region;
- acquiring a phase distribution of an image of the defect region;
- providing a point spread function of an imaging system;
- determining a repair region in the absorption region according to the point spread function and the phase distribution of the image of the defect region;
- and
- removing the absorption material of the repair region, using a mask repair tool, to form a repair feature.
A method, comprising:
- receiving a mask including a print feature and a defect;
- inspecting the mask to locate a defect region for the defect;
- determining a point spread function of an imaging system;
- identifying a repair region of the mask based on the point spread function and the defect region;
- performing a repair process, using a mask repair tool, to the repair region of the mask to form a repair feature;
- exposing the mask to radiation in the imaging system to produce a first radiation from the print feature and a second radiation from the repair feature;
- and
- using the first radiation and the second radiation to expose a photoresist of a target.
Dependencies are inferred from the claim text.