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US 9,870,441 B1Granted
Snap-to valid pattern system and method
AssigneePDF Solutions, Inc.
InventorsElizabeth Lagnese, Jonathan Haigh
Life of this patent
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Abstract
Described is a method for implementing a snap to capability that enables the manufactured of a valid pattern in a semiconductor device, based upon an originally invalid pattern.
Claims7
A method of providing a physical pattern at one of a plurality of layers in a semiconductor integrated circuit, the method comprising the steps of:
- creating a representation of the physical pattern at the one of the plurality of layers in the semiconductor integrated circuit, the physical pattern representation corresponding to a valid pattern defined by data;
- snapping an invalid pattern defined by other data into the valid pattern, the step of snapping including determining a valid size and a valid position that approximates an invalid size and an invalid position of the invalid pattern, wherein the valid pattern includes at least a valid size and a valid position, and wherein the valid pattern is obtained based upon a plurality of golden cell valid patterns, wherein the plurality of golden cell valid patterns contain every allowable pattern;
- and
- producing, based upon the other data and the determined valid size and valid position, the semiconductor integrated circuit that includes the physical pattern.
1 more element
Dependencies are inferred from the claim text.