Back to results
US 9,869,937 B2Granted
Mirror arrangement for a lithography apparatus and method for producing the same
AssigneeCarl Zeiss SMT GmbH
InventorDirk Schaffer
Life of this patent
Estimating the term…
Abstract
A method for producing a mirror arrangement for a lithography apparatus is proposed, which comprises the following steps: producing a mirror body having a cavity delimited by a front wall, a rear wall and a side wall of the mirror body, the side wall being arranged between the front wall and the rear wall, wherein at least one supporting element is provided in the cavity between the front wall and the rear wall; and after producing the mirror body, at least partly removing the supporting element.
Claims33
An arrangement, comprising:
- a mirror body having a single cavity delimited by a front wall, a rear wall and a side wall between the front and rear walls,
- wherein:
- the side wall does not have a hole;
- the mirror body comprises a glass ceramic;
- and
- a ratio of a maximum lateral extent of the cavity to a maximum lateral extent of the mirror body is at least 0.75:1.
3 more elements
An arrangement, comprising:
- a mirror body having a single cavity delimited by a front wall, a rear wall and a side wall between the front and rear walls,
- wherein:
- the sidewall does not have a hole;
- and
- a ratio of a maximum lateral extent of the cavity to a maximum lateral extent of the mirror body is at least 0.75:1.
2 more elements
Dependencies are inferred from the claim text.