Detection apparatus, measurement apparatus, lithography apparatus, and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorHironori Maeda
Life of this patent
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Abstract
The present invention provides a detection apparatus which causes light to be incident obliquely on a substrate including a plurality of layers whose refractive indices are different from each other and detects a height of the substrate using light reflected from the substrate, the apparatus comprising an optical system including a polarizer for reducing s-polarized light and configured to cause light, in which s-polarized light has been reduced by the polarizer, to be incident on the substrate at an angle of incidence within a range of 40° to 55°.
Claims10
A detection apparatus for causing light to be incident obliquely on a substrate including a plurality of layers, including a top layer and an underlying layer, whose refractive indices are different from each other and detects a height of the substrate using light reflected from an interface between the top layer and the underlying layer, the apparatus comprising:
- an optical system including a polarizer for reducing, without completely removing, s-polarized light from light containing p-polarized light and the s-polarized light, and causing the light, in which the s-polarized light has been reduced by the polarizer, to be incident on the substrate,
- wherein the optical system is configured to cause the light to be incident on the substrate at an angle of incidence by which a ratio of an intensity of light reflected from a surface of the top layer to an intensity of light reflected from the interface is less than that in a case where the angle of incidence is a Brewster's angle.
A measurement apparatus for measuring a position of a mark on a substrate, the apparatus comprising:
- a stage configured to hold the substrate and being movable;
- and
- a detection apparatus configured to cause light to be incident obliquely on the substrate including a plurality of layers, including a top layer and an underlying layer, whose refractive indices are different from each other and detect a height of the substrate using light reflected from an interface between the top layer and the underlying layer,
- wherein the detection apparatus comprises:
- an optical system including a polarizer for reducing, without completely removing, s-polarized light from light containing p-polarized light and the s-polarized light, and causing the light, in which the s-polarized light has been reduced by the polarizer, to be incident on the substrate,
- wherein the optical system is configured to cause the light to be incident on the substrate at an angle of incidence by which a ratio of an intensity of light reflected from a surface of the top layer to an intensity of light reflected from the interface is less than that in a case where the angle of incidence is a Brewster's angle,
- wherein the stage is controlled based on a detection by the detection apparatus such so that a height of the mark falls within a tolerance.
A lithography apparatus for performing patterning on a substrate, the apparatus comprising:
- a measurement apparatus configured to measure a position of a mark on the substrate,
- wherein the measurement apparatus includes:
- a stage configured to hold the substrate and being movable;
- and
- a detection apparatus configured to cause light to be incident obliquely on the substrate including a plurality of layers, including a top layer and an underlying layer, whose refractive indices are different from each other and detect a height of the substrate using light reflected from an interface between the top layer and the underlying layer,
- wherein the detection apparatus comprises:
- an optical system including a polarizer for reducing, without completely removing, s-polarized light from light containing p-polarized light and the s-polarized light, and causing the light, in which the s-polarized light has been reduced by the polarizer, to be incident on the substrate,
- wherein the optical system is configured to cause the light to be incident on the substrate at an angle of incidence by which a ratio of an intensity of light reflected from a surface of the top layer to an intensity of light reflected from the interface is less than that in a case where the angle of incidence is a Brewster's angle,
- wherein the stage is controlled based on a detection by the detection apparatus so that a height of the mark falls within a tolerance.
A method of manufacturing an article, the method comprising steps of:
- performing patterning on a substrate using an lithography apparatus;
- processing the substrate, on which the patterning has been performed, to manufacture the article,
- wherein the lithography apparatus performs patterning on the substrate, the apparatus including:
- a measurement apparatus configured to measure a position of a mark on the substrate,
- wherein the measurement apparatus includes:
- a stage configured to hold the substrate and being movable;
- and
- a detection apparatus configured to cause light to be incident obliquely on the substrate including a plurality of layers, including a top layer and an underlying layer, whose refractive indices are different from each other and detect a height of the substrate using light reflected from an interface between the top layer and the underlying layer,
- wherein the detection apparatus includes:
- an optical system including a polarizer for reducing, without completely removing, s-polarized light from light containing p-polarized light and the s-polarized light, and causing the light, in which the s-polarized light has been reduced by the polarizer, to be incident on the substrate,
- wherein the optical system is configured to cause the light to be incident on the substrate at an angle of incidence by which a ratio of an intensity of light reflected from a surface of the top layer to an intensity of light reflected from the interface is less than that in a case where the angle of incidence is a Brewster's angle,
- wherein the stage is controlled based on a detection by the detection apparatus so that a height of the mark falls within a tolerance.
Dependencies are inferred from the claim text.