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US 9,869,932 B2Granted
Conductive pattern fabrication method
AssigneeToray Industries, Inc.
InventorsMiharu Tanabe, Yuichiro Iguchi, Kazutaka Kusano
Life of this patent
Estimating the term…
Abstract
A method of producing a conductive pattern includes a light-exposing step of exposing a layer or pattern including conductive particles A, an organic compound B having an unsaturated double bond and a photopolymerization initiator C, and positioned over a substrate to light rays having a broad spectrum, to thereby produce a conductive layer or a conductive pattern.
Claims21
A method of producing a conductive pattern comprising:
- a light-exposing step of exposing selected portions of a layer or pattern comprising conductive particles A, an organic compound B having a polymerizable unsaturated double bond and a photopolymerization initiator C, and positioned over a substrate to light rays,
- followed directly by a development step of contacting at least a selected portion of the layer or the pattern with an alkaline developer solution to remove unexposed portions of the layer,
- followed directly, but optionally, by a rinsing step of rinsing the layer or pattern, and
- followed directly by a second light-exposing step of exposing remaining portions of the layer or the pattern to light having a broad spectrum and wavelengths less than 400 nm being shielded to thereby produce a conductive layer or a conductive pattern.
1 more element
A method of producing a conductive pattern comprising:
- a light-exposing step of exposing selected portions of a layer or pattern comprising conductive particles A, an organic compound B having a polymerizable unsaturated double bond and a photopolymerization initiator C, and positioned over a substrate to light rays having a broad spectrum, wherein in the light-exposing step, light rays having wavelengths less than 400 nm are shielded,
- followed directly by a development step of contacting at least a selected portion layer with an alkaline developer solution to remove unexposed portions of the layer or the pattern, to thereby produce a conductive layer or a conductive pattern, and
- optionally, followed directly by a rinsing step of rinsing the layer or pattern.
Dependencies are inferred from the claim text.