Compound, resin, resist composition and method for producing resist pattern

A resist composition comprising:

• a resin which has no structural unit having an acid-labile group;
• a resin having an acid-labile group;
• and
• an acid generator;
• the resin which has no structural unit having an acid-labile group
• consisting of a structural unit derived from a compound represented by formula (I), or
• consisting of a structural unit derived from a compound represented by formula (I) and a structural unit having an alicyclic hydrocarbon group but not having a fluorine atom, or
• consisting of a structural unit derived from a compound represented by formula (I), a structural unit having an alicyclic hydrocarbon group but not having a fluorine atom, and a structural unit represented by formula (a4-0);
• wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom,
• R2 represents a —CH(Rf1)(Rf2),
• Rf1 and Rf2 each independently represent a C1 to C6 perfluoroalkyl group,
• A1 represents a single bond, a C1 to C6 alkanediyl group or *-A3-X1-(A4-X2)a-(A5)b-,
• * represents a binding site to an oxygen atom,
• A2 represents a C2 to C6 branched alkanediyl group,
• A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group,
• X1 and X2 each independently represent —O—, —CO—O— or —O—CO—,
• W1 represents a C5 to C18 divalent alicyclic hydrocarbon group,
• a represents 0 or 1, and
• b represents 0 or 1;
• wherein R5 represents a hydrogen atom or a methyl group,
• L5 represents a single bond or a C 1 to C4 saturated aliphatic hydrocarbon group,
• L3 represents a C1 to C8 perfluoroalkanediyl group, a C3 to C12 perfluorocycloalkanediyl group or a perfluoroadamantanediyl group, and
• R6 represents a hydrogen atom or a fluorine atom.