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US 9,869,650 B2Granted
Pattern inspection apparatus
AssigneeNuFlare Technology, Inc.
InventorNobutaka Kikuiri
Life of this patent
Estimating the term…
Abstract
A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a stage to mount the substrate thereon and to be movable, a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams, and a drive mechanism to move the detector in order to follow movement of the stage.
Claims10
A pattern inspection apparatus comprising:
- a column configured to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams;
- a stage configured to mount the substrate thereon and to be movable;
- a detector configured to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams;
- and
- a drive mechanism configured to move the detector in order to follow movement of the stage.
2 more elements
A pattern inspection apparatus comprising:
- a column configured to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams;
- a stage configured to mount the substrate thereon and to be movable;
- a plurality of detectors each configured to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams;
- a plurality of drive mechanisms each configured to move a corresponding detector of the plurality of detectors in order to follow movement of the stage;
- and
- an image generation processing circuitry configured to combine each data detected by the plurality of detectors and to generate an image of the pattern.
3 more elements
Dependencies are inferred from the claim text.