Method and device for examining a mask

A method for examining a mask comprising:

• providing a position data set having defect positions of the mask to be examined, in which the defect positions are determined prior to examining the mask, and the defect positions represent positions on the mask where defects may occur;
• providing a structure data set having the structure of the mask;
• providing structural features of the mask, the values of which are to be determined;
• and at each defect position:
• determining the values of the specified structural features of the structure by using a computing unit;
• selecting a measuring task from a plurality of measuring tasks based on specified decision criteria and the determined values of the structural features of the structure by using the computing unit, in which the values of the structural features are determined at the defect position that represents one of the positions on the mask where a defect may occur;
• and
• carrying out the determined measuring task in a manner controlled by the computing unit.