Curable composition for imprints, patterning method and pattern
AssigneeFUJIFILM Corporation
InventorsKunihiko Kodama, Yuichiro Enomoto, Kazuyuki Usuki, Tadashi Omatsu, Hirotaka Kitagawa
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Abstract
Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.
Claims20
A curable composition for imprints comprising:
- a polymerizable compound (A) which contains a compound having aromatic group(s) and/or alicyclic hydrocarbon group(s);
- a photo-polymerization initiator (B);
- and
- a non-polymerizable compound (C) having a weight average molecular weight of 150 to 10,000 and having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom,
- wherein the non-polymerizable compound (C) contains at least one species selected from the group consisting of polyalkylene glycol, polyalkylene glycol ether and polyalkylene glycol ester, and
- the content of constituents other than the polyalkylene glycol structure in the non-polymerizable compound (C) is 5% by mass or less.
A curable composition for imprints comprising:
- a polymerizable compound (A);
- a photo-polymerization initiator (B);
- a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom;
- and
- a polymerization inhibitor;
- wherein the content of constituents other than the polyalkylene glycol structure in the non-polymerizable compound (C) is 5% by mass or less, and
- the polymerization inhibitor is selected from the group consisting of hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6-tert-butylphenol), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), cerium (III) salt of N-nitrosophenyl hydroxylamine, phenothiazine, phenoxazine, 4-methoxynaphthol, 2,2,6,6-tetramethylpiperidine-1-oxyl, 2,2,6,6-tetramethylpiperidine, 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl, nitrobenzene, and dimethylaniline.
Dependencies are inferred from the claim text.