Germanium- and zirconium-containing composition for vapor deposition of zirconium-containing films
AssigneeL'Air Liquide, Société Anonyme our l'Etude et l'Exploitation des Procédés Georges Claude
InventorsClément Lansalot-Matras, Julien Lieffrig, Hana Ishii, Christian Dussarrat
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Abstract
Disclosed are Germanium- and Zirconium-containing precursors having one of the following formulae: wherein each R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; and a C1-C5 linear, branched, or cyclic fluoroalkyl groups. Also disclosed are methods of synthesizing the disclosed precursors and using the same to deposit Zirconium-containing films on substrates via vapor deposition processes.
Claims20
A process for the deposition of a Germanium doped Zirconium oxide film on a substrate, the process comprising the steps of:
- introducing a vapor of a Germanium- and Zirconium-containing precursor into a reactor having a substrate disposed therein and depositing at least part of the Germanium- and Zirconium-containing precursor onto the substrate and introducing an oxidizing gas into the reactor, the precursor having the following formula:
- wherein each R1, R2, R3, R4, R5, R6, R7, R8, and R9 is independently selected from the group consisting of H;
- a C1-C5 linear, branched, or cyclic alkyl group;
- and a C1-C5 linear, branched, or cyclic fluoroalkyl group.
A process for forming the cubic/tetragonal crystalline phase of a Zirconium oxide film on a substrate, the process comprising the steps of:
- introducing a vapor of a Germanium- and Zirconium-containing precursor into a reactor having a substrate disposed therein and depositing at least part of the Germanium- and Zirconium-containing precursor onto the substrate and introducing an oxidizing gas into the reactor, the precursor having the following formula:
- wherein each R1, R2, R3, R4, R5, R6, R7, R8, and R9 is independently selected from the group consisting of H;
- a C1-C5 linear, branched, or cyclic alkyl group;
- and a C1-C 5 linear, branched, or cyclic fluoroalkyl group.
Dependencies are inferred from the claim text.