Scalable multi-role surface-wave plasma generator
AssigneeStarfire Industries LLC
InventorsDavid N. Ruzic, Robert A. Stubbers, Brian E. Jurczyk
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Abstract
Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of heterostructures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.
Claims28
A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
- a microwave launch structure comprising:
- a dielectric insulator layer,
- a patch antenna adjacent the dielectric insulator layer,
- a conducting baseplate,
- a microwave signal generator providing a microwave frequency output signal, and
- an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna,
- wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate,
- wherein the microwave signal generator is configured to operate, in accordance with a control loop, to vary a frequency of the microwave frequency output signal, and
- wherein the microwave signal generator is configured to operate, in accordance with the control loop, to provide a plasma turn-on and an impedance matching in a response time in an order of 1 microsecond to 10 microseconds.
A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
- a microwave launch structure comprising:
- a dielectric insulator layer,
- a patch antenna adjacent the dielectric insulator layer,
- a conducting baseplate,
- a dielectric channel, formed on an adjacent surface of the patch antenna opposite the dielectric insulator layer, the dielectric channel providing a spacing between the patch antenna and the conducting baseplate,
- a microwave signal generator providing a microwave frequency output signal, and
- an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna,
- wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space between the patch antenna and the conducting baseplate, and
- wherein the dielectric insulator layer is functionally graded in a varying thickness over a surface of the patch antenna.
A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
- a microwave launch structure comprising:
- a dielectric insulator layer,
- a patch antenna adjacent the dielectric insulator layer,
- a conducting baseplate,
- a microwave signal generator providing a microwave frequency output signal, and
- an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna,
- wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate, and
- wherein the dielectric insulator layer is functionally graded in a varying thickness over a surface of the patch antenna.
A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
- a microwave launch structure comprising:
- a dielectric insulator layer,
- a patch antenna adjacent the dielectric insulator layer,
- a conducting baseplate,
- a microwave signal generator providing a microwave frequency output signal, and
- an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna,
- wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate, and
- wherein the surface-wave plasma source utilizes a structure, for gas injection or gas removal under a formation zone of the surface wave plasma, the structure taken from the group consisting of:
- a porous dielectric material and a porous metal material.
An integrated photovoltaic module processing station comprising:
- a surface-wave plasma source comprising a plurality of a microwave launch structure, each one of the plurality of the microwave launch structure comprising:
- a dielectric insulator layer,
- a patch antenna adjacent the dielectric insulator layer,
- a conducting baseplate,
- a dielectric channel, formed on an adjacent surface of the patch antenna opposite the dielectric insulator layer, the dielectric channel providing a spacing between the patch antenna and the conducting baseplate,
- a microwave signal generator providing a microwave frequency output signal, and
- an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna,
- wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate,
- wherein the microwave signal generator is configured to operate, in accordance with a control loop, to vary a frequency of the microwave frequency output signal;
- a wafer carrier;
- and
- a gaseous precursor and carrier gas injection and pumping subsystem.
Dependencies are inferred from the claim text.