Method of manufacturing a microphone

A method of manufacturing a microphone, comprising:

• preparing a substrate and forming an oxide layer pattern on the substrate and an oxide layer on a rear side of the substrate;
• forming a vibration membrane on the substrate by injecting conductive ions into the substrate using the oxide layer pattern as a mask;
• sequentially forming a sacrificial layer and a fixed electrode on the substrate and the vibration membrane by removing the oxide layer pattern;
• forming a first photoresist layer pattern on the fixed electrode and forming an air inlet by patterning the fixed electrode using the first photoresist layer pattern as a mask;
• forming a second photoresist layer pattern on a rear side of the oxide layer and forming a penetration hole through which a portion of the vibration membrane is exposed by etching a portion of the oxide layer and a portion of the rear side of the substrate;
• forming an air layer between the fixed electrode and the vibration membrane by removing a portion of the sacrificial layer;
• and
• forming a first pad connected to the fixed electrode and a second pad connected to the vibration membrane after the air inlet formed.