Substrate for display device and method of fabricating the same
AssigneeLG Display Co., Ltd.
InventorSeung-Ryong Lee
Life of this patent
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Abstract
A method for a display device is discussed. The method according to one embodiment includes forming a substrate of the display device; forming a thin film transistor on the substrate; and forming a passivation layer of a photosensitive organic material on the thin film transistor, the passivation layer having a contact hole exposing the thin film transistor. The photosensitive organic material comprises an ultraviolet absorber. The method according to the embodiment includes forming a blocking area in a mask above the contact hole; and absorbing, via the ultraviolet absorber, reflected ultraviolet (UV) rays passing by the blocking area in the mask above the contact hole.
Claims7
A method for a display device, the method comprising:
- forming a substrate of the display device;
- forming a thin film transistor on the substrate;
- forming a passivation layer of a photosensitive organic material on the thin film transistor, the passivation layer having a contact hole exposing the thin film transistor, wherein the photosensitive organic material comprises an ultraviolet absorber;
- forming a blocking area in a mask above the contact hole;
- and
- absorbing, via the ultraviolet absorber, reflected ultraviolet (UV) rays passing by the blocking area in the mask above the contact hole,
- wherein the ultraviolet absorber has an extinction coefficient of 214.3×105 to 551.5×105 for i-line UV rays having wavelengths of 365 mm, an extinction coefficient of 28.9×105 to 59.3×105 for h-line UV rays having wavelength of 405 nm, and an extinction coefficient of 3.53×105 to 8.85×105 for g-line UV rays having wavelength of 436 nm,
- wherein the photosensitive organic material further comprises:
- a photoinitiator which generates a free radical when the UV rays are irradiated;
- a crosslinker which links the free radical;
- a binder which binds the free radical;
- and
- a radical scavenger for removing the free radical,
- wherein the crosslinker comprises a multifunctional monomer, and
- wherein a critical exposure energy density of the photosensitive organic material is adjusted by an acid value of the multifunctional monomer.
A method for a display device, the method comprising:
- forming a substrate;
- forming a thin film transistor on the substrate;
- forming a passivation layer of a photosensitive organic material on the thin film transistor, the passivation layer having a contact hole exposing the thin film transistor,
- wherein the photosensitive organic material comprises an ultraviolet absorber;
- and
- absorbing, via the ultraviolet absorber, reflected ultraviolet (UV) rays having a wavelength longer than i-line UV rays,
- wherein the ultraviolet absorber has an extinction coefficient of 214.3×105 to 551.5×105 for i-line UV rays having wavelengths of 365 mm, an extinction coefficient of 28.9×105 to 59.3×105 for h-line UV rays having wavelength of 405 nm, and an extinction coefficient of 3.53×105 to 8.85×105 for g-line UV rays having wavelength of 436 nm,
- wherein the photosensitive organic material further comprises:
- a photoinitiator which generates a free radical when the UV rays are irradiated;
- a crosslinker which links the free radical;
- a binder which binds the free radical;
- and
- a radical scavenger for removing the free radical,
- wherein the crosslinker comprises a multifunctional monomer, and
- wherein a critical exposure energy density of the photosensitive organic material is adjusted by an acid value of the multifunctional monomer.
Dependencies are inferred from the claim text.