Semiconductor devices

A semiconductor device comprising:

• a plurality of line patterns that are spaced apart from one another and comprise a plurality of main lines that have a first gap therebetween and extend in a first direction;
• and a plurality of sublines that are bent from one end of each of the plurality of main lines,
• wherein ends of the plurality of sublines are spaced apart in a second direction from a line on which each of the plurality of main lines is disposed,
• wherein the plurality of line patterns comprise a plurality of line sets, wherein four continuously arranged line patterns of the plurality of line patterns form one line set, and
• wherein at least one line set among the plurality of line sets comprises:
• a first subline set comprising a first main line and a second main line that have a first gap therebetween and extend in the first direction, and a first subline and a second subline that are bent respectively from one end of each of the first main line and the second main line, that have therebetween a second gap that is greater than the first gap, and comprise portions that extend in the first direction;
• and
• a second subline set comprising a third main line and a fourth main line that have the first gap therebetween and extend in the first direction, and a third subline and a fourth subline that have therebetween a third gap that is greater than the first gap and extend in a second direction, which is different from the first direction, respectively from one end of each of the third main line and the fourth main line.

A semiconductor device comprising a plurality of line patterns that are spaced apart from one another, each of the plurality of line patterns comprising a main line that extends in a first direction and a subline that is bent from one end of the main line,

• wherein the plurality of line patterns comprise a plurality of line sets, wherein four continuously arranged line patterns of the plurality of line patterns form one line set,
• wherein at least one line set among the plurality of line sets comprises:
• a first subline set comprising a first main line and a second main line that have a first gap therebetween and extend in the first direction, and a first subline and a second subline that are bent respectively from one end of each of the first main line and the second main line, that have therebetween a second gap that is greater than the first gap, and comprise portions that extend in the first direction;
• a second subline set comprising a third main line and a fourth main line that have the first gap therebetween and extend in the first direction, and a third subline and a fourth subline that have therebetween a third gap that is greater than the first gap and extend in a second direction, which is different from the first direction, respectively from one end of each of the third main line and the fourth main line;
• and
• a plurality of pad patterns that are connected to a second end of each of the main lines.