Semiconductor device and semiconductor memory device
AssigneeKabushiki Kaisha Toshiba
InventorsChika Tanaka, Daisuke Matsushita
Life of this patent
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Abstract
According to one embodiment, a semiconductor device includes a first region having a first conductivity type in a semiconductor region; a second region having a second conductivity type in the semiconductor region; a gate electrode above a first part of the semiconductor region between the first region and the second region; a gate insulating layer between the first part and the gate electrode; a third region having the first conductivity type below the second region; and a fourth region across the second region and the third region and including a first impurity.
Claims20
A semiconductor device comprising:
- a first region having a first conductivity type in a semiconductor region;
- a second region having a second conductivity type in the semiconductor region;
- a gate electrode above a first part of the semiconductor region between the first region and the second region;
- a gate insulating layer between the first part and the gate electrode;
- a third region having the first conductivity type below the second region;
- and
- a fourth region across the second region and the third region and including a first impurity.
A semiconductor memory device comprising:
- a first word line;
- a first bit line and a second bit line;
- and
- a first memory cell including a first data holding circuit, a first transistor connected between the first data holding circuit and the first bit line, and a second transistor connected between the first data holding circuit and the second bit line,
- wherein each of the first and second transistors includes:
- a first region disposed in a first semiconductor region and connected to the first data holding circuit, the first region having a first conductivity type;
- a second region disposed in the first semiconductor region and connected to the first or second bit line, the second region having a second conductivity type;
- a first gate electrode above a first part of the first semiconductor region between the first region and the second region, the first gate electrode connected to the first word line;
- a first gate insulating layer between the first part and the first gate electrode;
- a third region having the first conductivity type below the second region;
- and
- a fourth region across the second region and the third region and including a first impurity.
Dependencies are inferred from the claim text.