Extreme ultraviolet light generation apparatus
AssigneeGigaphoton Inc.
InventorsFumio Iwamoto, Masaki Nakano, Tsukasa Hori
Life of this patent
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Abstract
An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target.
Claims17
An extreme ultraviolet light generation apparatus comprising:
- a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber;
- a target supply part configured to supply the target into the chamber;
- and
- a target collector having an opening that faces the target supply part, and including a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target, a liquid film of the target being formed on the receiving surface.
An extreme ultraviolet light generation apparatus comprising:
- a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber;
- a target supply part configured to supply the target into the chamber;
- and
- a target collector having an opening that faces the target supply part, and including a filter configured to allow the target to pass therethrough, and a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target, a liquid film of the target being formed on the receiving surface.
Dependencies are inferred from the claim text.