Rotatable heated electrostatic chuck
AssigneeApplied Materials, Inc.
InventorsAnantha K. Subramani, Ashish Goel, Wei W. Wang, Bharath Swaminathan, Vijay D. Parkhe, Xiaoxiong Yuan
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AssigneeApplied Materials, Inc.
InventorsAnantha K. Subramani, Ashish Goel, Wei W. Wang, Bharath Swaminathan, Vijay D. Parkhe, Xiaoxiong Yuan
Estimating the term…
An electrostatic chuck includes a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode is disposed within the dielectric disk; a radio frequency (RF) bias plate disposed below the dielectric disk; a plurality of lamps disposed below the RF bias plate to heat the dielectric disk; a metallic plate disposed below the lamps to absorb heat generated by the lamps; a shaft coupled to the second surface of the dielectric disk at a first end of the shaft to support the dielectric disk in a spaced apart relation to the RF bias plate and extending away from the dielectric disk and through the RF bias plate and the metallic plate; and a rotation assembly coupled to the shaft to rotate the shaft and the dielectric disk with respect to the RF bias plate, lamps, and metallic plate.
An electrostatic chuck, comprising:
An electrostatic chuck, comprising:
An electrostatic chuck, comprising:
Dependencies are inferred from the claim text.