Method of manufacturing pressure sensor, deposition system, and annealing system
AssigneeKabushiki Kaisha Toshiba
InventorsYoshihiko Fuji, Hideaki Fukuzawa, Shiori Kaji
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AssigneeKabushiki Kaisha Toshiba
InventorsYoshihiko Fuji, Hideaki Fukuzawa, Shiori Kaji
Estimating the term…
A method of manufacturing a pressure sensor comprises: above a film portion formed on one surface of a substrate, depositing a first magnetic layer, a second magnetic layer and an intermediate layer between the first and second magnetic layers on one surface of a substrate; removing the deposited layers leaving a part thereof; and removing a part of the substrate from another surface of the substrate. By removing the deposited layers leaving a part thereof, a strain detecting element is formed in a part of a first region, the strain detecting element comprising the first magnetic layer, the second magnetic layer and the intermediate layer. By removing a part of the substrate, a part of the first region of the substrate is removed. In addition, the deposition of the first magnetic layer is performed with the substrate being bended.
A deposition system comprising:
A deposition system comprising:
A deposition system comprising:
Dependencies are inferred from the claim text.