Method for fabricating an image-sensor structure
AssigneeVisEra Technologies Company Limited
InventorsChih-Kuo Huang, Che-Sheng Lin
Life of this patent
Estimating the term…
Abstract
An image-sensor structure is provided. The image-sensor structure includes a substrate having a first surface and a second surface and including a sensing area, a first metal layer formed above the first surface of the substrate and surrounding the sensing area, and a protection layer formed above the first surface of the substrate and overlying the sensing area and a part of the first metal layer to expose an exposed area of the first metal layer. The exposed area includes a first portion having a first width, a second portion having a second width, a third portion having a third width and a fourth portion having a fourth width.
Claims20
A method for fabricating an image-sensor structure, comprising:
- providing a substrate having a first surface and a second surface and comprising a sensing area;
- forming a first metal layer above the first surface of the substrate and surrounding the sensing area;
- and
- forming a protection layer above the first surface of the substrate and overlying the sensing area and a part of the first metal layer to expose an exposed area of the first metal layer, wherein the exposed area comprises a first portion having a first width, a second portion having a second width, a third portion having a third width and a fourth portion having a fourth width, wherein the first width of the first portion, the second width of the second portion, the third width of the third portion and the fourth width of the fourth portion of the exposed area of the first metal layer are respectively greater than 35 μm.
A method for fabricating an image-sensor structure, comprising:
- providing a substrate having a first surface and a second surface and comprising a sensing area;
- forming a first metal layer above the first surface of the substrate and surrounding the sensing area;
- forming a second metal layer underneath the second surface of the substrate of a substrate structure;
- and
- forming a protection layer above the first surface of the substrate and overlying the sensing area and a part of the first metal layer to expose an exposed area of the first metal layer, wherein the exposed area comprises a first portion having a first width, a second portion having a second width, a third portion having a third width and a fourth portion having a fourth width, wherein a shortest horizontal distance from the sensing area to the second metal layer is defined, and half of the shortest horizontal distance from the sensing area to the second metal layer is greater than the first width of the first portion, the second width of the second portion, the third width of the third portion and the fourth width of the fourth portion of the exposed area of the first metal layer.
Dependencies are inferred from the claim text.