Back to results
US 9,852,955 B2Granted
Method and arrangement for analyzing a semiconductor element and method for manufacturing a semiconductor component
AssigneeAms AG
InventorsHelene Gehles, Thomas Bodner, Joerg Siegert
Life of this patent
Estimating the term…
Abstract
According to the improved concept, a method for analyzing a semiconductor element comprising polymer residues located on a surface of the semiconductor element is provided. The method comprises marking at least a fraction of the residues by exposing the semiconductor element to a fluorescent substance and detecting the marked residues by visualizing the marked residues on the surface of the semiconductor element using fluorescence microscopy.
Claims21
A method for analyzing a semiconductor element comprising polymer residues located on a surface, the method comprising
- marking at least a fraction of the residues by exposing the semiconductor element to a fluorescent substance, wherein the exposing comprises exposing the semiconductor element to a mixture containing the fluorescent substance and carbon dioxide;
- and
- detecting the marked residues by visualizing the marked residues on the surface of the semiconductor element using fluorescence microscopy.
Dependencies are inferred from the claim text.