Single platform, multiple cycle spacer deposition and etch
AssigneeApplied Materials, Inc.
InventorsHao Chen, Chentsau (Chris) Ying, Srinivas D. Nemani, Ellie Y. Yieh
Life of this patent
Estimating the term…
Abstract
A first portion of a multiple cycle spacer is formed on a sidewall of a patterned feature over a substrate. A spacer layer is deposited on the first portion using a first plasma process. The spacer layer is etched to form a second portion of the multiple cycle spacer on the first portion using a second plasma process. A cycle comprising depositing and etching of the spacer layer is continuously repeated until the multiple cycle spacer is formed.
Claims12
An apparatus to manufacture an electronic device, comprising:
- a plurality of mask features on a device layer on a substrate, each of the plurality of mask features comprising
- a top surface;
- a bottom surface;
- a first side surface and a second side surface between the top surface and the bottom surface;
- a plurality of spacer layers between the top surface and the bottom surface, the plurality of spacer layers comprising a first spacer layer on a second spacer layer on a third spacer layer, wherein the first side surface is a part of the first spacer layer and the second side surface is a part of the third spacer layer, wherein the first side surface and the second side surface are exposed, wherein each of the spacer layers is a nitride layer.
An apparatus to manufacture an electronic device, comprising:
- a plurality of mask features on a device layer on a substrate, each of the plurality of mask features comprising
- a top surface;
- a bottom surface;
- a first side surface and a second side surface between the top surface and the bottom surface;
- a plurality of spacer layers between the top surface and the bottom surface, the plurality of spacer layers comprising a first spacer layer on a second spacer layer on a third spacer layer, wherein the first side surface is a part of the first spacer layer and the second side surface is a part of the third spacer layer, wherein the first side surface and the second side surface are exposed, wherein the second spacer layer, the first spacer layer and the third spacer layer are of the same material.
An apparatus to manufacture an electronic device, comprising:
- a plurality of mask features on a device layer on a substrate, each of the plurality of mask features comprising
- a top surface;
- a bottom surface;
- a first side surface and a second side surface between the top surface and the bottom surface;
- a plurality of spacer layers between the top surface and the bottom surface, the plurality of spacer layers comprising a first spacer layer on a second spacer layer on a third spacer layer, wherein the first side surface is a part of the first spacer layer and the second side surface is a part of the third spacer layer, wherein the first side surface and the second side surface are exposed, wherein the plurality of spacer layers comprise at least 5 spacer layers.
Dependencies are inferred from the claim text.