Slide part and surface processing method of the same
AssigneeJapan Aviation Electronics Industry, Limited
InventorsAkinobu Sato, Akiko Suzuki, Takeshi Kawano
Life of this patent
Estimating the term…
Loading patent…
AssigneeJapan Aviation Electronics Industry, Limited
InventorsAkinobu Sato, Akiko Suzuki, Takeshi Kawano
Estimating the term…
A slide part has a surface structure in which there are at least two periodic structures among a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive, a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, and a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, in which one of the at least two periodic structures is formed on the other periodic structure.
A slide part comprising at least one surface structure among a first surface structure in which a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive is formed on a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, a second surface structure in which the first periodic structure is formed on a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, and a third surface structure in which the first periodic structure is formed on the second periodic structure and the second periodic structure is formed on the third periodic structure.
A method of processing a surface of a slide part using a gas cluster ion beam, comprising radiating the gas cluster ion beam to the surface of the slide part from a direction parallel to a slide direction of the slide part in order to form, on the surface of the slide part, at least one surface structure among a first surface structure in which a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive is formed on a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, a second surface structure in which the first periodic structure is formed on a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, and a third surface structure in which the first periodic structure is formed on the second periodic structure and the second periodic structure is formed on the third periodic structure.
A method of processing a surface of a slide part using a gas cluster ion beam, the method comprising radiating the gas cluster ion beam to the surface of the slide part in order to form, on the surface of the slide part, at least one surface structure among a first surface structure in which a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive is formed on a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, a second surface structure in which the first periodic structure is formed on a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, and a third surface structure in which the first periodic structure is formed on the second periodic structure and the second periodic structure is formed on the third periodic structure, with an angle formed by the gas cluster ion beam to be radiated and a line normal to the surface of the slide part being within a range from 30 degrees to 75 degrees inclusive.
A method of processing a surface of a slide part using a gas cluster ion beam, the method comprising radiating the gas cluster ion beam to the surface of the slide part from a direction parallel to a slide direction of the slide part and another gas cluster ion beam to the surface of the slide part from a direction opposite to the former direction in order to form, on the surface of the slide part, at least one surface structure among a first surface structure in which a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive is formed on a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, a second surface structure in which the first periodic structure is formed on a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, and a third surface structure in which the first periodic structure is formed on the second periodic structure and the second periodic structure is formed on the third periodic structure.
A method of processing a surface of a slide part using a gas cluster ion beam, the method comprising radiating the gas cluster ion beam to the surface of the slide part in order to form, on the surface of the slide part, at least one surface structure among a first surface structure in which a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive is formed on a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, a second surface structure in which the first periodic structure is formed on a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, and a third surface structure in which the first periodic structure is formed on the second periodic structure and the second periodic structure is formed on the third periodic structure, with an angle formed by the gas cluster ion beam to be radiated and a line normal to the surface of the slide part being within a range from 30 degrees to 75 degrees inclusive and with another gas cluster ion beam being irradiated to the surface of the slide part from a direction opposite to an irradiation direction of the former gas cluster ion beam.
Dependencies are inferred from the claim text.
Drawings are temporarily unavailable. Open the PDF at USPTO
From the US filing history. Foreign family members aren’t listed.
For evaporating or etching: for microworking, e. g. etching of gratings or trimming of electrical components
Tools as parts of machines covered by this subclass: lubricating , e.g. lubricating tool and workpiece simultaneously
Characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or…
Processes for removing metallic material from surfaces, not provided for in group
About 5 years 9 months of term left · ends 1 Aug 2032 (estimated)
The present invention relates to a slide part such as a mold for precisely forming fine connectors or other electronic devices 5 and a method of processing the surface of the slide part.
Many slide parts such as drills or other tools, molds, and engine parts are industrially used. For example, in press mold working, the lubrication mechanism on the friction interface during processing greatly affects the quality characteristics such as reduction of burrs of a press molded product and the durability of the mold of a punch or die. This lubrication mechanism includes an injection mechanism, which injects a lubricant into the friction interface, and a friction reduction mechanism, which uses a lubricant to reduce friction on the friction interface.
One injection mechanism uses projections and depressions on the material surface to inject the lubricant. There are various sizes of projections and depressions (surface roughness) on the surface of a workpiece or mold. The lubricant applied to the workpiece or mold before processing is stored in the depressions on the surface (storage effect). If there is no space to which the lubricant escapes when the mold and the workpiece make contact each other, the lubricant is encapsulated in the depressions and the lubricant is supplied to the friction interface with this state maintained. The depressions containing the lubricant are referred to as micro pools or lubricant pools in plastic working. This type of injection mechanism is expected in all types of plastic working.
FIG. 1 schematically shows the occurrence of adhesion in press working (the prior art) even using a mold having a very flat surface, specifically, an illustration (a) in FIG. 1 shows the state before the press working and an illustration (b) in FIG. 1 shows the state after the press working;
FIG. 2 shows transfer particles observed by a scanning electron microscope;
FIG. 3 schematically shows the occurrence of adhesion in press working (the prior art) using a mold with periodic projections and depressions on its surface, specifically, an illustration (a) in FIG. 3 shows the state before the press working and an illustration (b) in FIG. 3 shows the state after the press working;
As described above, if small projections and depressions are formed on the surface of a slide part in advance, the lubricant applied to the slide part or its counterpart before processing is stored in the depressions (micro pools) on the surface. If there is no space to which the lubricant escapes when the slide part and its counterpart make contact each other, the lubricant is encapsulated in the micro pools and supplied to the friction interface with this state maintained.
Even when a lubricant injection mechanism supplies a large amount of lubricant to the friction interface, however, a continuous fluid lubrication film is rarely formed over the entire friction interface. This is particularly true for, for example, press working. There are two types of contact states on the friction interface: a solid/solid contact state, in which the slide part and its counterpart make contact each other, and a solid/liquid contact state, in which the slide part and the lubricant in micro pools make contact each other. In the solid/solid contact state, boundary lubrication is dominant and metallic bonds also occur at the friction interface. On the other hand, in the solid/liquid contact state, a high hydrostatic fluid pressure is applied to the lubricant in micro pools and a state similar to fluid lubrication is achieved.
For example, if a mold, which is a slide part 1, has a very flat surface, since a lubricant 2 escapes from the friction interface between the mold and a workpiece 3 as shown in FIG. 1, the workpiece 3 readily adheres to the mold. Reference numeral 4 indicates an adhesive portion (only one adhesive portion is indicated by the reference numeral to eliminate complexity of the drawing). FIG. 2 shows the adhesion of the workpiece 3 to the mold observed by a scanning electron microscope. Transfer particles (enclosed by the circles in the figure) are observed which are formed because parts of workpiece are left on the surface of the mold when the adhesive part 4 of the workpiece 3 and the mold is separated. It is found from the observation that many transfer particles have a diameter of hundreds of nanometers to one micrometer. When periodic projections and depressions 1a are formed on the surface of the mold as in the prior art, the solid/solid contact state is relieved and adhesion of the workpiece 3 is reduced because the lubricant 2 is supplied to the friction interface as shown in FIG. 3. In addition, when irregular projections and depressions 1b are formed on the surface of the mold as shown in FIG. 4, adhesion of the workpiece 3 is also reduced. In such conditions, however, it is impossible to prevent adhesion to the workpiece 3. This is because boundary lubrication is dominant in the solid/solid contact state as described above.