Charged particle beam drawing apparatus and charged particle beam drawing method

A charged particle beam drawing apparatus comprising:

• an area density calculation processing circuitry calculating a pattern area density of a pattern to be drawn on a substrate based on drawing data;
• a shot data generation processing circuitry generating shot data which is formed of shot of a charged particle beam as a component unit using the drawing data, and in which a shot size, a shot position and an irradiation amount are defined;
• an irradiation amount determination processing circuitry determining whether or not the irradiation amount defined in the shot data is greater than or equal to an irradiation amount lower limit value corresponding to the pattern area density;
• an irradiation amount resetting processing circuitry changing the irradiation amount in the shot data to the irradiation amount lower limit value when the irradiation amount defined in the shot data is less than the irradiation amount lower limit value;
• a shot size adjustment processing circuitry changing the shot size defined in the shot data, based on an amount of the change in the irradiation amount made by the irradiation amount resetting processing circuitry;
• a shot position adjustment processing circuitry changing the shot position defined in the shot data, based on an amount of the change in the shot size made by the shot size adjustment processing circuitry;
• and
• a drawing device drawing a pattern by irradiating the substrate with the charged particle beam, using the shot data in which the irradiation amount, the shot size, and the shot position have been changed.