Photosensitive polysiloxane composition and uses thereof

A photosensitive polysiloxane composition comprising:

• a polysiloxane (A);
• an o-naphthoquinone diazide sulfonic acid ester (B);
• an alkali-soluble resin containing a silyl group (C);
• and
• a solvent (D);
• wherein the polysiloxane (A) is copolymerized by a compound represented by Formula (4),
• Si(Ra)W(ORb)4-W Formula (4),
• wherein:
• Ra represents hydrogen, an alkyl group containing 1 to 10 carbon atoms, an alkenyl group containing 2 to 10 carbon atoms, an aryl group containing 6 to 15 carbon atoms, an alkyl group containing an acid anhydride group, an alkyl group containing an epoxy group, or an alkoxy group containing an epoxy group;
• when Ra is plural, each Ra is the same or different;
• at least one of Ra represents the alkyl group containing the acid anhydride group;
• Rb represents hydrogen, an alkyl group containing 1 to 6 carbon atoms, an acyl group containing 1 to 6 carbon atoms, an aryl group containing 6 to 15 carbon atoms;
• when Rb is plural, each Rb is the same or different;
• and
• W represents an integer from 0 to 3.