Resist composition, method of forming resist pattern, compound, and acid diffusion control agent
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTakashi Nagamine, Kotaro Endo, Hideto Nito
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Abstract
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z− represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m. Z−(Mm+)1/m (d1)
Claims10
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1) shown below:
- Z−(Mm+)1/m (d1)
- wherein Z− represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom;
- m represents an integer of 1 or more;
- and Mm+ represents an organic cation having a valency of m.
Dependencies are inferred from the claim text.