Photoresist composition and method of manufacturing substrate for display device by using the same

A method of manufacturing a substrate for a display device, the method comprising:

• forming a photoresist layer on a substrate using a photoresist composition that includes a) an alkali soluble resin, b) a hardening agent, e) a photo acid generator represented by Formula 1, and d) an organic solvent;
• and
• exposing and developing the photoresist layer to form an organic insulating film having a first hole,
• wherein in Formula 1,
• L11 is selected from a single bond, a C1-C10 alkylene group, a C2-C10 alkenylene group, and a C2-C10 alkynylene group;
• and
• R11 is selected from a C6-C15 aryl group;
• or
• a C6-C15 aryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C1-C10 alkyl group, a C1-C10 alkoxy group, and a C6-C15 aryl group.

A photoresist composition comprising:

• an acryi copolymer in an amount of 25 wt. %;
• a novolac based resin in an amount of 25 wt. %;
• a melamine-based resin in an amount of about 3 wt. % to about 7 wt. %;
• a photo acid generator comprising at least one selected from Compounds 1 and 2 in an amount of about 1 to about 7 wt. %;
• and
• a balance being propylene glyeolmonomethyletheracetate,