Imprint apparatus

An imprint apparatus that forms a pattern of a resin on a region to be processed of a substrate using a mold including a pattern region on which a pattern is formed, the imprint apparatus comprising:

• a correction unit configured to correct a shape of a target region that is either the pattern region on the mold or the region to be processed on the substrate,
• wherein the correction unit further includes:
• a first heating unit configured to heat the target region, the first heating unit including a light quantity adjusting unit configured to adjust a light quantity of light emitted from a light source;
• a scanning unit configured to scan a heating region having an area smaller than that of the pattern region on the mold with respect to the target region;
• and
• a control unit configured to acquire information regarding a deformation amount for correcting a shape of the target region and control the first heating unit and the scanning unit based on the information,
• wherein the light quantity adjusting unit is configured to adjust the light quantity of the light in accordance with scanning the heating region.