Display device and manufacturing method thereof
AssigneeSamsung Display Co., Ltd.
InventorsChoi Sang Park, Seong Gyu Kwon, Tae Woo Lim
Life of this patent
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Abstract
A display device according to an exemplary embodiment includes: a substrate including a display area and a peripheral area; a thin film transistor positioned in the display area of the substrate; a first electrode connected to the thin film transistor; a roof layer positioned on the first electrode and spaced apart from the first electrode by a microcavity that is interposed between the roof layer and the first electrode; a liquid crystal layer positioned inside the microcavity; an encapsulation layer positioned on the roof layer; a pad portion positioned in the peripheral area of the substrate; and a pillar positioned in the peripheral area of the substrate.
Claims15
A manufacturing method of a display device comprising:
- forming a thin film transistor in a display area of a substrate including a display area, a peripheral area, and an extra area;
- forming a first electrode to be connected to the thin film transistor;
- forming a sacrificial layer on the first electrode;
- forming a roof layer on the sacrificial layer;
- forming a microcavity between the first electrode and the roof layer by removing the sacrificial layer;
- forming an encapsulation layer on the roof layer;
- cutting the encapsulation layer positioned on a boundary between the display area and peripheral area of the substrate;
- cutting a boundary between the peripheral area and extra area of the substrate;
- and
- removing the encapsulation layer positioned in the peripheral area and extra area of the substrate, and the extra area of the substrate.
Dependencies are inferred from the claim text.