Anti-reflection film and production method therefor

A method of producing an anti-reflection film, comprising:

• applying, onto a substrate, a composition for forming a medium-refractive index layer containing a binder resin and inorganic fine particles, followed by curing of the composition to form a medium-refractive index layer;
• sputtering a metal oxide or a metal nitride onto the medium-refractive index layer, or sputtering a metal onto the medium-refractive index layer while introducing oxygen to oxidize the metal, to form a high-refractive index layer;
• and
• sputtering a metal oxide or a metal fluoride onto the high-refractive index layer to form a low-refractive index layer,
• wherein a refractive index nS of the substrate, a refractive index nM of the medium-refractive index layer, and a refractive index nH of the high-refractive index layer satisfy the following expression (1):
• n
• H
• -
• 1
• n
• H
• +
• 1
• -
• 1
• -
• 4
• ⁢
• n
• M
• 2
• ⁢
• n
• S
• n
• M
• 2
• ⁡
• (
• 1
• +
• n
• S
• )
• 2
• -
• (
• 1
• -
• n
• M
• 2
• )
• ⁢
• (
• n
• M
• 2
• -
• n
• S
• 2
• )
• ≧
• 0.02
• (
• 1
• )
• where the refractive index nS of the substrate, the refractive index nM of the medium-refractive index layer, and the refractive index nH of the high-refractive index layer have a relationship of nH>nM>nS.