Anti-arc zero field plate
AssigneeApplied Materials, Inc.
InventorsJonghoon Baek, Edwin C. Suarez, Tsutomu Tanaka, Edward P. Hammond, IV, Jeonghoon Oh
Life of this patent
Estimating the term…
Abstract
Embodiments of the present invention generally relate to apparatus for reducing arcing and parasitic plasma in substrate processing chambers. The apparatus generally include a processing chamber having a substrate support, a backing plate, and a showerhead disposed therein. A showerhead suspension electrically couples the backing plate to the showerhead. An electrically conductive bracket is coupled to the backing plate and spaced apart from the showerhead. The electrically conductive bracket may include a plate, a lower portion, an upper portion, and a vertical extension. The electrically conductive bracket contacts an electrical isolator.
Claims12
A vacuum processing chamber, comprising:
- a backing plate disposed in a chamber body;
- a showerhead disposed in the chamber body and coupled to the backing plate;
- one or more showerhead suspensions electrically coupling the backing plate to the showerhead;
- an electrically conductive bracket coupled to the backing plate and spaced apart from the showerhead suspension, the electrically conductive bracket comprising a plate positioned substantially perpendicular to a face of the showerhead;
- and
- an electrical isolator having a first side contacting the plate of the electrically conductive bracket and a second side contacting the chamber body, the electrical isolator positioned radially outward of the electrically conductive bracket.
A processing chamber, comprising:
- a chamber body;
- a lid disposed on the chamber body;
- a showerhead disposed in the chamber body;
- an electrically conductive bracket electrically coupled to the showerhead, the electrically conductive bracket disposed laterally outward of the showerhead and in a spaced apart relation to the showerhead;
- and
- an electrical insulator disposed against a radially-outward surface of the electrically conductive bracket, the electrical insulator positioned radially outward of the electrically conductive bracket, the electrical insulator in contact with the chamber body.
Dependencies are inferred from the claim text.