Cobalt polishing accelerators

A method of chemically mechanically polishing a substrate comprising:

• contacting a substrate with a polishing pad and a chemical-mechanical polishing composition comprising:
• (a) abrasive particles,
• (b) a cobalt accelerator selected from a compound having the formula:
• NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R2, and R3 are hydrogen;
• dicarboxyheterocycles;
• heterocyclylalkyl-α-amino acids;
• N-(amidoalkyl)amino acids;
• unsubstituted heterocycles;
• alkyl-substituted heterocycles;
• substituted-alkyl-substituted heterocycles;
• N-aminoalkyl-α-amino acids,
• (c) a cobalt corrosion inhibitor, wherein the cobalt corrosion inhibitor comprises an anionic head group and a C8-C14 aliphatic tail group;
• and combinations thereof,
• (d) an oxidizing agent that oxidizes cobalt, and
• (e) water,
• wherein the polishing composition has a pH of about 3 to about 8.5,
• (ii) moving the polishing pad and the chemical mechanical polishing composition relative to the substrate, and
• (iii) abrading at least a portion of the substrate to polish the substrate.