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US 9,846,375 B2Granted
Lithography apparatus with segmented mirror
AssigneeCarl Zeiss SMT GmbH
InventorJoachim Hartjes
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Abstract
A lithography apparatus is disclosed, which comprises a mirror having at least two mirror segments which are joined together in such a way that an interspace is formed between the mirror segments, and a sensor for detecting the relative position of the mirror segments, wherein the sensor is arranged in the interspace between the mirror segments.
Claims17
An apparatus, comprising:
- a mirror comprising first and second mirror segments joined together to define an interspace between the first and second mirror segments;
- and
- a sensor configured to detect a relative position of the first and second mirror segments,
- wherein the sensor is in the interspace between the first and second mirror segments, and the apparatus is a lithography apparatus, and
- wherein the interspace is configured so that a relative movement of the first and second mirror segments results in a pressure change in the interspace, and the sensor comprises a pressure sensor configured to generate a sensor signal dependent on the pressure in the interspace.
2 more elements
Dependencies are inferred from the claim text.