Wiping mechanism, liquid droplet jetting apparatus, and wiping method
AssigneeFUJIFILM Corporation
InventorJun Yamanobe
Life of this patent
Estimating the term…
Abstract
Provided are a wiping mechanism, a liquid droplet jetting apparatus, and a wiping method capable of preventing infiltration of bubbles into a nozzle when a nozzle surface is wiped by a wiping member. A wiping member (200) comes into contact with a nozzle surface (78) with a nozzle through which liquid droplets are jetted and is formed by weaving weft yarns (220) and warp yarns (210), in which the wiping member (200) in which the weft yarns (220) are further exposed to the nozzle surface (78A) side than the warp yarns (210) is moved relative to the nozzle surface (78A) along the warp yarns (210).
Claims12
A wiping mechanism comprising:
- a wiping member which comes into contact with a nozzle surface with a nozzle through which liquid droplets are jetted, and is formed by weaving weft yarns and warp yarns, the weft yarns being further exposed to the nozzle surface side than the warp yarns;
- and
- a moving mechanism which moves the wiping member relative to the nozzle surface along the warp yarns,
- wherein the diameter of the weft yarn is smaller than an opening diameter of the nozzle.
A wiping method comprising:
- moving a wiping member, which comes into contact with a nozzle surface with a nozzle through which liquid droplets are jetted, and is formed by weaving weft yarns and warp yarns, the weft yarns being further exposed to the nozzle surface side than the warp yarns, relative to the nozzle surface along the warp yarns,
- wherein the wiping member, in which the diameter of the weft yarn is smaller than an opening diameter of the nozzle, is used.
Dependencies are inferred from the claim text.