Three-dimensional neural probe microelectrode array and method of manufacture

A method for manufacturing a neural probe electrode assembly, the method comprising:

• providing a platform workpiece comprising a sidewall and having a thickness extending between spaced apart upper and lower face walls, wherein an oxide layer resides in the platform workpiece between the upper and lower face walls and is sandwiched between a first silicon layer and a second silicon layer;
• providing an upper mask on the upper face wall and a lower mask on the lower face wall, wherein the upper and lower masks provide respective upper and lower perimeters outlining a shape of a slot to be provided through the thickness of the platform workpiece, wherein the slot is configured to receive a neural probe array;
• etching from the upper face wall partway through the thickness of the platform workpiece to the oxide layer to thereby provide an upper portion of the slot bounded by and spaced from the sidewall;
• and
• etching from the lower face wall a remaining portion of the thickness of the platform workpiece including the oxide layer to thereby provide a finished platform having a lower portion of the slot bounded by and being spaced from the sidewall, wherein the finished platform has the upper and lower portions of the slot in open communication with each other to provide the slot extending to the upper and lower platform surfaces.