Methods for top-down fabrication of wafer scale TMDC monolayers
AssigneeUchicago Argonne, LLC
InventorsSaptarshi Das, Mrinal K. Bera, Andreas K. Roelofs, Mark Antonio
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AssigneeUchicago Argonne, LLC
InventorsSaptarshi Das, Mrinal K. Bera, Andreas K. Roelofs, Mark Antonio
Estimating the term…
A method of forming a TMDC monolayer comprises providing a multi-layer transition metal dichalcogenide (TMDC) film. The multi-layer TMDC film comprises a plurality of layers of the TMDC. The multi-layer TMDC film is positioned on a conducting substrate. The conducting substrate is contacted with an electrolyte solution. A predetermined electrode potential is applied on the conducting substrate and the TMDC monolayer for a predetermined time. A portion of the plurality of layers of the TMDC included in the multi-layer TMDC film is removed by application of the predetermined electrode potential, thereby leaving a TMDC monolayer film positioned on the conducting substrate.
A method of forming a TMDC monolayer, comprising:
A method of forming a transition metal dichalcogenide (TMDC) monolayer, comprising:
A method, comprising:
Dependencies are inferred from the claim text.