Surface mechanical attrition treatment (SMAT) methods and systems for modifying nanostructures
AssigneeCity University of Hong Kong
InventorsChristohper Michael Lee, Yang Yang Li, Jian Lu
Life of this patent
Estimating the term…
Loading patent…
AssigneeCity University of Hong Kong
InventorsChristohper Michael Lee, Yang Yang Li, Jian Lu
Estimating the term…
Described herein are systems and methods for performing a surface mechanical attrition treatment (SMAT) to the surface of a variety of materials including thin films, nanomaterials, and other delicate and brittle materials. In an aspect, a surface of a material is modified to a modified surface and from an original state to a modified state, wherein the modified state comprises a physical modification, a chemical modification, or a biological modification. In another aspect, a surface mechanical attrition treatment (SMAT) is applied to the modified surface of the material for a defined duration of time, wherein a condition associated with the SMAT is adjusted based on a structural composition of the material. In yet another aspect, a defined strain is imposed on the structural composition of the material based on the SMAT.
A method, comprising:
A method, comprising:
A method, comprising:
Dependencies are inferred from the claim text.